Lithography  Instruments
 

 150nm Dense/Isolated Contact Hole Study with Canon IDEAL Technique
6Visits  0.0 Stars  1 Vote  Level? 
Processing Techniques in the Manufacture of 100nm Node and Below Inspection Test Reticles
0Visits  0.0 Stars  1 Vote  Level? 
Metrology Methods Comparison for 2D Structures on Binary and Embedded Attenuated Phase Shift Masks
0Visits  0.0 Stars  1 Vote  Level? 
Application of a Multiple Wavelength Absorption Endpoint System in a Photomask Dry Etcher
3Visits  0.0 Stars  1 Vote  Level? 
Photomask CD metrology at the 100nm node
11Visits  0.0 Stars  1 Vote  Level? 
Measuring and Assessing Printability of Reticle Pinhole Defects
0Visits  0.0 Stars  1 Vote  Level? 
Improved Method for Measuring and Assessing Reticle Pinhole Defects
2Visits  0.0 Stars  1 Vote  Level? 
Photomask Blank Shelflife Study on EBeam Chemically Amplified Resists
1Visits  0.0 Stars  1 Vote  Level? 
Characterization of Quartz Etched PSM Masks for KrF Lithography at the 100 nm node
3Visits  0.0 Stars  1 Vote  Level? 
Comparison of Contact Hole Definition using Laser and Shaped EBeam Mask Writers and its Influence on Wafer Level Pattern Fidelity
61Visits  0.0 Stars  1 Vote  Level? 
Tip Shape Effects in Scanning Probe Metrology
8Visits  0.0 Stars  1 Vote  Level? 
Comparison of 2D Measurement Methodologies and Their Viability in a Manufacturing Environment
2Visits  3.0 Stars  2 Vote  Level? 
Optimization and Scaledown of WaferBased Resist Strip and Rinse Processes for Photomask Production
2Visits  0.0 Stars  1 Vote  Level? 
Improved Method for Measuring and Assessing Reticle Pinhole Defects for the 100nm Lithography Node
1Visits  0.0 Stars  1 Vote  Level? 
Application of Vector Scan Electron Beam Lithography to 45nm Node Extreme Ultraviolet Lithography Reticles
1Visits  0.0 Stars  1 Vote  Level? 
Application of Chromeless Phase Lithography (CPL) masks in ArF lithography
7Visits  3.0 Stars  2 Vote  Level? 
Back to Square 9, A Demonstration of 9 Reticle Capability
0Visits  0.0 Stars  1 Vote  Level? 
Cpk and Ppk: One Capability Index Is Not Enough to Measure Photomask CD Performance
1Visits  0.0 Stars  1 Vote  Level? 
Utilizing Effective Statistical Process Control Limits for Critical Dimension Metrology
4Visits  0.0 Stars  1 Vote  Level? 
Characteristics of Selective MoSiON Etching in a Chlorine Plasma. ICP power, bias power, pressure, and gas concentration.
1Visits  0.0 Stars  1 Vote  Level? 
Preserving EAPSM Phase and Transmission in the Clean Process  MoSiONbased masks
1Visits  0.0 Stars  1 Vote  Level? 
Imaging 100 nm Contacts with High Transmission Attenuated Phase Shift Masks
4Visits  0.0 Stars  1 Vote  Level? 
A Comparative Evaluation of Mask Production CAR Development Processes with Stepwise Defect Inspection
0Visits  0.0 Stars  1 Vote  Level? 
Higher Anisotropy and Improved Surface Conditions for 90nm Node MoSiON ICP Dry Etch
0Visits  0.0 Stars  1 Vote  Level? 
90nm Node CD Uniformity Improvement Using a Controlled Gradient Temperature CAR PEB Process
2Visits  0.0 Stars  1 Vote  Level? 
Optimum PEC Conditions Under Resist Heating Effect Reduction for 90nm Node Mask Writing
0Visits  0.0 Stars  1 Vote  Level? 
Inspection Capability of Chromeless PhaseShift Masks for the 90nm Node
8Visits  0.0 Stars  1 Vote  Level? 
Process Monitoring of Etched Fused Silica Phase Shift Reticles
0Visits  0.0 Stars  1 Vote  Level? 
Optimizing Etch Uniformity for Alternating Aperture Phase Shift Masks on Etec Systems' Tetra™ Photomask Etch System
3Visits  0.0 Stars  1 Vote  Level? 
Cr Photomask Etch Performance and its Modeling
0Visits  0.0 Stars  1 Vote  Level? 
Lithography
52Visits  4.0 Stars  3 Vote  Introduction 
Lithography Analyses Simulator
9Visits  2.0 Stars  2 Vote  Introduction 
Projection Photolithography
44Visits  3.2 Stars  5 Vote  Intermediate 
Advanced Semiconductor Lithography
48Visits  4.5 Stars  2 Vote  Intermediate 
Achieving Low Wavefront Specifications for DUV Lithography; Impact of Residual Stress in HPFS® Fused Silica
13Visits  4.0 Stars  1 Vote  Research 
Keywords: Lithography  Instruments Nb of links = 35  
